Name: 11x11 Lab Grown Diamond Seeds Rough CVD Diamond Wafers Plate Colorless Industrial
Brand: Shaper Diamond Technology Co., Ltd
SKU: JSD
Price: 1,000.00 USD
Availability: InStock

Home Products Mechanical CVD Diamond

11x11 Lab Grown Diamond Seeds Rough CVD Diamond Wafers Plate Colorless Industrial

Product Details:

Place of Origin:	Hunan, China
Brand Name:	Infi
Model Number:	JSD

Payment & Shipping Terms:

Minimum Order Quantity:	10pcs
Price:	To be negotiated
Packaging Details:	packed in box then into carton
Delivery Time:	7 working days
Payment Terms:	T/T, Western Union, PayPal
Supply Ability:	100pcs/7days

Contact Now

Detailed Product Description

Size:	11x11x0.3mm	Color:	Colorless
Product Name:	Cvd Diamond Plate	Hardness (microhardness):	80～150GPa
Young's Modulus:	1150～130OGPa	Thermal Expansion Coefficient:	10-.K-l
Coefficient Of Friction:	0.05~0.05	Thermal Conductivity:	1500-2000 W/ (m·K)
Highlight:	11x11 Lab Grown Diamond Seeds , Colorless Rough CVD Diamond Wafers , Industrial Cvd Diamond Plate

11×11 Lab Grown Diamond Seeds Rough CVD Diamond Wafers Plate Colorless Industrial

Product Specifications

Attribute	Value
Size	11×11×0.3mm
Color	Colorless
Product Name	CVD Diamond Plate
Hardness (microhardness)	80～150GPa
Young's modulus	1150～1300GPa
Thermal expansion coefficient	10^-6K^-1
Coefficient of friction	0.05～0.05
Thermal conductivity	1500-2000 W/(m·K)

Product Overview

Our 11×11×0.3mm Lab Grown Diamond Rough CVD Diamond Wafers are produced using Chemical Vapor Deposition (CVD) technology. This process decomposes carbon-containing gases under controlled conditions to form high-quality single crystal diamond layers on substrates.

Key Characteristics

CVD single crystal diamonds offer exceptional thermal stability comparable to natural diamonds, with isotropic properties due to their disordered grain arrangement. These plates contain no metal catalysts, ensuring superior performance in demanding applications.

Technical Specifications

Nitrogen content: <50ppm
Boron Concentration [B]: <0.05 ppm
Nitrogen Concentration: <20 ppm
Two sides polished, Ra <20 nm
Lateral Dimensions Measured to smaller side
L + W tolerance (0, +0.3 mm)
Thickness tolerance (0, +0.1mm)

Available Sizes

3×3×0.3mm

4×4×0.3mm

5×5×0.3mm

6×6×0.3mm

7×7×0.3mm

8×8×0.3mm

9×9×0.6mm

10×10×0.3mm

11×11×0.3mm

12×12×0.3mm

13×13×0.3mm

15×15×0.3mm

Quality Assurance

Precision laser-cut edges with <100> orientation
{100} face orientation
No polycrystalline black spots or cracks under 20× magnification
Perfect cutting without missing corners
Uniform stress distribution under polarizer

Suggested Applications

Ideal for use as substrates/seeds for single crystal CVD growth, cutting and grinding tools, heat spreaders, and optical components where exceptional hardness and thermal conductivity are required.

Product Images