Name: 10x10x0.3mm Lab Grown Diamond Seeds Rough CVD Diamond Plate Mechanical Grade
Brand: Shaper Diamond Technology Co., Ltd
SKU: JSD
Price: 1,000.00 USD
Availability: InStock

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10x10x0.3mm Lab Grown Diamond Seeds Rough CVD Diamond Plate Mechanical Grade

Product Details:

Place of Origin:	Hunan, China
Brand Name:	Infi
Model Number:	JSD

Payment & Shipping Terms:

Minimum Order Quantity:	10pcs
Price:	To be negotiated
Packaging Details:	packed in box then into carton
Delivery Time:	7 working days
Payment Terms:	T/T, Western Union, PayPal
Supply Ability:	100pcs/7days

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Detailed Product Description

Size:	10x10x0.3mm	Color:	Colorless
Product Name:	Cvd Diamond Plate	Hardness (microhardness):	80～150GPa
Young's Modulus:	1150～130OGPa	Thermal Expansion Coefficient:	10-.K-l
Coefficient Of Friction:	0.05~0.05	Thermal Conductivity:	1500-2000 W/ (m·K)
Highlight:	10x10x0.3mm Lab Grown Diamond Seeds , Rough Lab Grown Diamond Seeds , CVD Diamond Plate Mechanical Grade

10x10x0.3mm Lab Grown Diamond Seeds Rough CVD Diamond Plate Mechanical Grade

Product Specifications

Attribute	Value
Size	10x10x0.3mm
Color	Colorless
Product Name	CVD Diamond Plate
Hardness (microhardness)	80～150GPa
Young's modulus	1150～1300GPa
Thermal expansion coefficient	10^-6K^-1
Coefficient of friction	0.05~0.05
Thermal conductivity	1500-2000 W/(m·K)

Product Description

Single crystal diamond CVD (chemical vapor deposition) refers to a type of diamond produced using the CVD process. In this process, a mixture of carbon-containing gases is decomposed under controlled conditions, resulting in the formation of a single crystal diamond layer on a substrate.

CVD Single Crystal Diamond Properties

Compared to other forms of synthetic diamond, single crystal diamond CVD has a highly ordered crystal structure, which gives it superior physical and mechanical properties. This makes it ideal for high-performance applications where hardness and thermal conductivity are critical factors.

Diamond material has the highest thermal conductivity among natural materials known (up to 2200W/(m·K) - 7.5 times that of AIN and 4.5 times that of SiC). Combined with stable chemical properties, high insulation, and small dielectric constant, single crystal diamond is the premier material for next-generation high-power, high-frequency, and low-power electronic devices.

Manufacturing Process

Using microwave plasma-assisted chemical vapor deposition (MPACVD), the microwave resonance system breaks down carbon-containing gas and corrosive gas at low/medium pressures to generate plasma. Our growth strategy enables homoepitaxial growth in the 100, 110, and 111 growth directions of type IIb diamond seed crystals.

Available Sizes

3x3x0.3mm
4x4x0.3mm
5x5x0.3mm
6x6x0.3mm
7x7x0.3mm
8x8x0.3mm
9x9x0.6mm
10x10x0.3mm
11x11x0.3mm
12x12x0.3mm
13x13x0.3mm
15x15x0.3mm

Key Features

Positive tolerance in length, width, and thickness
No polycrystalline black spots or cracks under 20x magnification
Precision cutting without missing corners
Uniform stress distribution under polarizer
4pt/100 orientation
Laser-cut edges with <100> edge orientation
{100} face orientation
L + W tolerance (0, +0.3 mm), thickness tolerance (0, +0.1mm)
Surface options: Two sides polished (Ra < 20 nm), one side polished, or unpolished
Boron concentration <0.05 ppm
Nitrogen concentration <20 ppm