Brief: Discover the 11x11 Lab Grown Diamond Seeds Rough CVD Diamond Wafers Plate, a high-quality industrial solution. Produced using Chemical Vapor Deposition (CVD) technology, these colorless diamond wafers offer exceptional thermal stability and isotropic properties. Perfect for demanding applications like cutting tools and heat spreaders.
Related Product Features:
11×11×0.3mm size with precise dimensions and polished surfaces.
Colorless CVD diamond wafers with no metal catalysts for superior performance.
Exceptional thermal stability and isotropic properties comparable to natural diamonds.
Hardness ranging from 80 to 150 GPa, ideal for industrial applications.
High thermal conductivity of 1500-2000 W/(m·K) for efficient heat dissipation.
Low nitrogen content (<50ppm) and boron concentration (<0.05 ppm) for purity.
Precision laser-cut edges with <100> orientation and uniform stress distribution.
Available in multiple sizes from 3×3mm to 15×15mm for versatile use.
FAQs:
What is the size of the CVD diamond wafers?
The standard size is 11×11×0.3mm, but they are also available in sizes ranging from 3×3mm to 15×15mm.
What are the key characteristics of these diamond wafers?
These wafers offer exceptional thermal stability, isotropic properties, high hardness (80-150 GPa), and superior thermal conductivity (1500-2000 W/(m·K)).
What are the suggested applications for these diamond wafers?
They are ideal for substrates/seeds for single crystal CVD growth, cutting and grinding tools, heat spreaders, and optical components requiring high hardness and thermal conductivity.